Silicon CapacitorsSilicon Capacitor Generalities

Silicon Capacitor Generalities

Murata high-density silicon capacitors have been developed with a semiconductor MOS process and are using 3D structures to substantially increase the electrode surfaces, and therefore increase the capacitance for a given footprint.
Murata silicon technology is based on a monolithic structure embedded in a noncrystalline substrate (single MIM and multi-MIM – Metal Insulator Metal).

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    Image 1 of silicon capacitor
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Silicon capacitor features

Higher performance in a smaller package

This advanced 3D topology gives a developed active capacitance area equivalent to 80 ceramic layers in an amazing 100 µm thickness (lower values available on request). Thanks to a very linear and low dispersive dielectric, miniaturization, capacitance value and electrical performances are optimized.

High stability over temperature
Up to 250°C environments

Signal stability over frequency
Up to 220GHz applications

Stability regarding voltage
For High Voltage applications

Stability over aging
Minimum lifetime of 10 years

Extreme low thickness
Down to 50µm

Differences from MLCCs

10 times reliability of MLCC capacitors technologies

Coming from the same DNA as the semiconductor MOS process, Murata silicon capacitors have a default mode fully modelized with proven consistent data and offer therefore predictable and exceptional reliable performances. Our silicon capacitors technology features up to 10 times higher reliability than alternative capacitors technologies, mainly obtained thanks to the oxide generated during the high temperature curing. Furthermore, all electrical tests are completed at the end of the production steps which avoids early failures.

Graph 1 of differences from MLCCs
Graph 2 of differences from MLCCs